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[ATM] Fwd: [atm_free] Effect of pH on polishing fused silica was Re. Session 24...]



Hello!

So, I missed the start of this thread, but FYI, I
thought I would add that sometimes a surface is called
out as a fused silica Super Polish.  Minimum rms
surface, plus, must stand a Hyrofluric Acid (3%) bath
for 10 minutes, and not show any defects that had
their 'flowed' glass filler removed.  PH of 4, using
Hastalite PO refined ceria. Slurry is kept in
suspension using a electric mixer like you would find
in  your kitchen. 

Works great

Bill Marriott
http://StarlightOptical.com


--- Guy Brandenburg <gfbrandenburg@yahoo.com> wrote:

> Interesting comments on pH levels and polishing with
> CeO2
> 
> Alan Bromborsky <brombo@comcast.net> wrote: Date:
> Thu, 30 Aug 2007 17:37:14 -0400
> From: Alan Bromborsky <brombo@comcast.net>
> To: Guy Brandenburg <gfbrandenburg@yahoo.com>
> Subject: [Fwd: [atm_free] Effect of pH on polishing
> fused silica was Re. Session
>  24...]
> 
>  
> To: atm_free@yahoogroups.com
> From: "Mark Cowan" <toolontop@yahoo.com>
> Date: Thu, 30 Aug 2007 19:47:54 -0000
> Subject: [atm_free] Effect of pH on polishing fused
> silica was Re. Session 24...
> 
>                                I was looking through
> the paper I cited in the last post and noted the
>  following about hydration layers and silicate
> redeposition:
>  
>  Buffering the CeO2 slurry to pH 4 increased the
> drag greatly, but
>  according to the paper and the assorted
> micrographic and AFM imagery
>  the resulting surface is much smoother - /because/
> (they say) the
>  redeposition from the slurry is greatly reduced. 
> Thus the polishing
>  action is surface removal primarily.  They also say
> the lap lasts much
>  longer because the "ceria particles are suspended
> in the slurry rather
>  than embedded in the lap."  The lack of the
> redeposited layer means
>  that the final surface is made from the pure
> substrate, and so might
>  bond to the coating better, improving coating life.
>  
>  Perhaps you need to start with a fresh lap for this
> experiment. I plan
>  to test some of this with the robotic figuring
> machine, which is much
>  more capable than I am of maintaining constant lap
> speed against high
>  resistance.
>  
>  Best,
>  Mark
>  
>  > Here's an interesting experiment that
> demonstrates that.  
>  > 
>  > H. Highstone set me a copy of an Applied Optics
> paper from '92 (pp
>  > 7164-7172, Vol 31, no 34) that explored the use
> of various agents
>  > (CeO2, ZrO2, Al2O3, Y2O3, YF3) on fused silica at
> varying pH ratios. 
>  > Al2O3 has by far the highest roughness of any of
> these compounds. 
>  > Anyway, lowering the pH from 7 to 4 with CeO2 on
> fused silica lowers
>  > the roughness by a factor of almost 4x under
> controlled conditions. 
>  > You can use citric acid to buffer the pH of a
> slurry down to these
>  > levels.  I've tried it.  The lap drag immediately
> becomes /enormous/,
>  > to the point that the lap can't be moved
> smoothly.  Although it may
>  > result in lower roughness under machine control,
> by hand the result
>  > was horrible, with roughness quite visible under
> Foucault testing.
>  
>  
>      
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> Guy Brandenburg, Washington, DC
> My home page on astronomy, mathematics, education:
>
http://home.earthlink.net/~gfbranden/GFB_Home_Page.html
> or else 
> http://tinyurl.com/r6fh2
> 
> =============================
> "Thus, from the war of nature, from famine and
> death, the most exalted object which we are 
> capable of conceiving, namely, the production of the
> higher animals, directly follows. There is
> grandeur in this view of life, with its several
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